Seminarium Fizyki Politechniki Wrocławskiej
PWr, bud. A1, sala 322
X-ray Diffraction – XRD Laboratory at the Department of Semiconductor Materials Engineering
Prof. Jarosław Serafińczuk
Department of Semiconductor Materials Engineering, Faculty of Fundamental Problems of Technology, Wroclaw University of Science and Technology
X-ray diffraction (XRD) is one of the fundamental and most widely used techniques in materials science research. It enables detailed analysis of crystalline materials by providing key structural parameters. Using XRD, we can reliably determine:
- phase composition and phase identification,
- lattice parameters and crystal structure,
- crystallite size and microstrain,
- residual stresses,
- texture (preferred orientation),
- and many other properties.
The XRD Laboratory of the Department of Semiconductor Materials Engineering is equipped with state-of-the-art instrumentation (Marveln Panalytical Empyrean diffractometer) that allows measurements under non-ambient conditions, significantly extending the range of possible experiments. Our equipment includes:
- high-temperature chambers (up to 600 °C in air or controlled atmosphere),
- low-temperature attachments (down to ~12 K),
- high pressure measurements in DAC up to 15GPa,
- capability for in-situ and operando experiments.
During the seminar, I would like to present selected XRD techniques that I have routinely used in my previous and ongoing research projects from powder to epitaxial material and structures.
At the same time, I will demonstrate the full research capabilities of our laboratory and show how these advanced tools can be applied to solve contemporary challenges in semiconductor materials engineering, nanotechnology, and related fields.
Everyone interested in structural characterization of materials is warmly invited!
