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Wykład w ramach WSD IPAN

09:30 wtorek, 28-03-23
Aula INTiBS PAN

Introduction to epitaxial methods and characterization; part 1 of 2

prof. Detlef Hommel

INTiBS PAN and Łukasiewicz Research Network - PORT

Outline:

Semiconductor epitaxy is a well-established method to obtain hetrostructures for optoelectronic and microelectronic applications.
In the first lecture an overview will be given concerning the growth methods. The next two lectures will concentrate on structural and spectroscopic characterization

Wykład jest otwarty i zapraszamy wszystkich chętnych.

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